Kyma Technologies offers a range of advanced crystal growth tools designed to meet the demanding requirements of the semiconductor industry. With a focus on III-N materials and gallium oxide (Ga2O3), Kyma's tools enable the production of high-quality crystals for various applications in power electronics, optoelectronics, and photovoltaics.Kyma's External Metal-Halide Sources are designed for the growth of III-N materials, providing a reliable and efficient means of delivering high-purity metal-halide precursors to the growth chamber. These sources are compatible with various growth techniques, including HVPE and MOCVD, and are known for their exceptional flux stability and uniformity.
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Kyma's external metal-halide sources enable a robust, cost-effective extension of existing crystal growth capabilities to enable new materials compositions.
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Kyma's K200™ HVPE Growth Tool is the industry's first fully automated large diameter hydride vapor phase epitaxy (HVPE) growth tool.
The K200™ HVPE Growth Tool design benefits from hundreds of engineering advances achieved over 15 years of experience at Kyma in the application of HVPE to the growth of GaN, AlN, AlGaN and Ga2O3.
Kyma's staff has multiple decades of accumulated experience in the design and manufacture of several types of vapor phase crystal growth tools for compound semiconductor materials growth.
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