Polycrystalline GaN

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Polycrystalline GaN

Kyma's polycrystalline GaN (polyGaN) materials are useful for applications that require higher purity and/or lower surface area than legacy sources.Kyma's polycrystalline GaN is available in a number of form factors - see the table below. Customers have reported improved results across a variety of GaN growth methods, including pulsed laser deposition (PLD), sputtering, ammonothermal, and solution growth, when comparing our high purity material to traditional feedstock materials available elsewhere. Kyma also offers polycrystalline GaN powder which is described in our nanocrystalline materials section.

Product Details


  • Uniform and reproducible polycrystalline GaN layers
  • Tunable material properties through doping and composition control
  • Scalable deposition processes for high-volume manufacturing
  • Compatibility with various substrate materials (Si, SiC, Al2O3, etc.)


  • Cost-effective alternative to single-crystal GaN substrates
  • Versatile platform for diverse applications
  • Improved thermal management and heat dissipation
  • Compatibility with existing manufacturing processes]


  • Power Electronics (Transistors, Rectifiers, Inverters)
  • Optoelectronic Devices (LEDs, Laser Diodes)
  • Sensors and Actuators
  • Coatings and Surface Treatments
  • Functional Thin Films and Nanostructures

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