Aluminum Nitride (AlN) Templates
In the field of nitride semiconductors, an “AlN template” refers to a composite substrate which includes a thin layer of AlN deposited epitaxially on a foreign substrate. Kyma’s AlN templates are built on sapphire or silicon and are available from 2" to 200mm in diameter.
Kyma AlN templates are used to provide a low cost alternative to 2-step nitride nucleation processes. Kyma uses these templates for all of our GaN epitaxy, on all substrate types. There are a number of benefits that customers realize from these templates:
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PVDNC has excellent scalability which results in lower cost of ownership when ramping production
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LED customers report:
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Better wavelength uniformity
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Higher LED brightness
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Better nucleation repeatability than low temperature MOCVD nucleation
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Advanced PVDNC reactor capacity can be dedicated to strategic customers for a lower-cost, fully-dedicated supply of PVDNC AlN Templates.
Specification Sheets
AlN on Sapphire Specification Sheet
- Grades: Prime, production and research
- Sizes: 2"-8"
- AlN thickness: 25nm (best for MOCVD growth) and custom (10nm-2um)
AlN on Silicon Specification Sheet
- Grades: Prime, production and research
- Sizes: 2"-12"
- AlN thickness: 200nm (best for MOCVD growth) and custom (10nm-200nm)
